Deposition Techniques


Deposition techniques refer to the methods used to deposit thin films of materials onto a substrate in a controlled manner. In the context of space and astronautical engineering, deposition techniques are used to create coatings and thin films on spacecraft components and instruments. These coatings can serve a variety of purposes, such as protecting against radiation and extreme temperatures, improving thermal control, and enhancing the performance of sensors and other instruments. Some common deposition techniques used in space and astronautical engineering include physical vapor deposition (PVD), chemical vapor deposition (CVD), and atomic layer deposition (ALD). PVD involves heating a material until it vaporizes and then condensing it onto a substrate, while CVD involves introducing a gas containing the desired material into a chamber and allowing it to react with the substrate. ALD is a more precise technique that involves alternating the exposure of the substrate to two or more gases in a controlled manner to build up a thin film layer by layer.


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