Vapor Deposition
Vapor deposition is a process of depositing thin films of materials onto a substrate by heating the material in a vacuum chamber until it evaporates and then allowing the vaporized atoms or molecules to condense onto the substrate. This process is commonly used in the manufacturing of electronic devices, such as semiconductors and solar cells, as well as in the production of coatings for optical and decorative applications. The thickness and properties of the deposited film can be controlled by adjusting the temperature, pressure, and composition of the vapor. There are several types of vapor deposition techniques, including physical vapor deposition (PVD) and chemical vapor deposition (CVD), each with their own advantages and limitations.
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