Photolithography
Photolithography is a process used in the fabrication of microelectronic circuits and micro-electromechanical systems (MEMS). It involves the use of light to transfer a geometric pattern from a photomask (also called a reticle) to a light-sensitive chemical photoresist on the substrate. The photoresist is then developed to selectively remove either the exposed or unexposed regions of the substrate. This process is repeated multiple times with different masks and photoresists to create the desired pattern on the substrate. Photolithography is a critical step in the manufacturing of integrated circuits, as it allows for the creation of the intricate patterns that define the circuitry.
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