Photomask
In space and astronautical engineering, a photomask is a high-precision quartz or glass plate that contains a patterned opaque film used to transfer the pattern to a substrate. Photomasks are used in the fabrication of microelectronic circuits, micro-electromechanical systems (MEMS), and other microstructures. In the context of space and astronautical engineering, photomasks are used in the production of microfabricated devices such as microthrusters, microvalves, and microsensors. The photomask is used to define the pattern that will be transferred to the substrate using a process such as photolithography. The accuracy and precision of the photomask are critical to the success of the microfabrication process, as any errors or defects in the photomask will be transferred to the final product.
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