Extreme Ultraviolet Light
Extreme Ultraviolet (EUV) Light is a type of electromagnetic radiation with a wavelength range of 10-124 nanometers. EUV light is produced by highly ionized plasmas and is used in various applications in space and astronautical engineering, including lithography for semiconductor manufacturing, solar physics, and remote sensing. EUV light is absorbed by most materials, including air, so it requires specialized optics and vacuum environments for its use. EUV lithography is a key technology for the production of advanced microprocessors and memory chips, enabling the creation of smaller and more powerful devices. In solar physics, EUV light is used to study the Sun's corona and its magnetic field, providing insights into space weather and its effects on Earth. Remote sensing using EUV light can provide high-resolution images of the Earth's upper atmosphere and ionosphere, aiding in the study of atmospheric dynamics and space weather.
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